Application:
》Clean room environment analysis
》Wafer surface analysis
》Material quality control for semiconductor & solar industry

          
Item Molecular Formula Concentration Package
Nitric Acid HNO3 55% / 69% 560 g/Btl
Hydrofluoric Acid HF 38% / 49% 500 g/Btl
Hydrogen Peroxide H2O2 31% / 35% 580 g/Btl
Ammonia Solution NH4OH 20% / 29% 450 g/Btl

Specification :
HNO3、H2O2、NH4OH
Quality control 47 trace elements;34 elements < 5 ppt ,
Normal pollution element : Al、Ca、Cr、 Fe、K、 Hg、Mg、Ni、Se、Na、Ti、Zn、Cu < 10 ppt

HF
47 trace elements;33 elements < 5 ppt ,
Normal pollution element : Al、Ca、Cr、Fe、K、Hg、Mg、Ni、Se、Na、 Ti、Zn、Cu、As < 10 ppt

 

Item Molecular Formula Concentration Package
Hydrochloric Acid HCl 20% /3 6% 500 g/Btl
Sulfuric Acid H2SO4 96% / 98% 750 g/Btl
Phosphoric Acid H3PO4 86% 750 g/Btl
Specification :
HCl
Quality control 47 trace elements < 20 ppt,
H2SO4
Quality control 47 trace elements ; 46 elements< 20 ppt,
Normal pollution element : Zn < 75ppt
H3PO4
Quality control 47 trace elements ; 44 elements < 1 ppb
Normal pollution element : As、Fe、Sb < 10 ppb

  

Item Abbreviation Concentration Package
Isopropyl Alcohol IPA 99 % 500 mL/Btl
N-Methyl-2-Pyrrolidone NMP 99 % 500 mL/Btl
n-Butyl acetate nBAC 99 % 500 mL/Btl
OK-73 thinner OK-73 - 500 mL/Btl
Specification :
IPA、NMP、nBAC、OK-73

Quality control for 47 trace elements;33 elements < 5 ppt ,
Normal pollution element : Al、Ca、Cr、 Fe、K、 Hg、Mg、Ni、Se、Na、Sn、Ti、Zn、Cu < 10 ppt